Arnz, M.: search on Z-Library

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1

Digital artery flaps for closure of soft tissue defects of the forefoot

William M. Dutch, Michael Arnz, Gary Peter Jolly

Journal:

The Journal of Foot and Ankle Surgery

Year:

2003

Language:

english

File:

PDF, 3.47 MB

english, 2003

2

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - Photomask registration and overlay metrology by means of 193 nm optics

Klose, Gerd, Kawahira, Hiroichi, Zurbrick, Larry S., Kerwien, Norbert, Arnz, Michael, Beyer, Dirk, Rosenkranz, Norbert

Year:

2008

Language:

english

File:

PDF, 387 KB

english, 2008

3

SPIE Proceedings [SPIE 22nd European Mask and Lithography Conference - Dresden, Germany (Monday 23 January 2006)] 22nd European Mask and Lithography Conference - Calibration of test masks used for lithography lens systems

Arnz, M., Häβler-Grohne, W., Bodermann, B., Bosse, H.

Year:

2006

Language:

english

File:

PDF, 536 KB

english, 2006

4

SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVI - Yokohama, Japan (Wednesday 8 April 2009)] Photomask and Next-Generation Lithography Mask Technology XVI - Calibration strategies for precision stages in state-of-the-art registration metrology

Huebel, Alexander, Hosono, Kunihiro, Schellhorn, Uwe, Arnz, Michael, Klose, Gerd, Beyer, Dirk

Year:

2009

Language:

english

File:

PDF, 260 KB

english, 2009

5

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Optical Microlithography X - Toward a comprehensive control of full-field image quality in optical photolithography

Flagello, Donis G., de Klerk, Jos, Davies, Guy, Rogoff, Richard, Geh, Bernd, Arnz, Michael, Wegmann, Ulrich, Kraemer, Michael, Fuller, Gene E.

Year:

1997

Language:

english

File:

PDF, 1.99 MB

english, 1997

6

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Improving registration metrology by correlation methods based on alias-free image simulation

Seidel, D., Montgomery, M. Warren, Maurer, Wilhelm, Arnz, M., Beyer, D.

Year:

2010

Language:

english

File:

PDF, 360 KB

english, 2010

7

Population changes in a biofilm reactor for phosphorus removal as evidenced by the use of FISH

Christina M. Falkentoft, Elisabeth Müller, Patrik Arnz, Poul Harremoës, Hans Mosbæk, Peter A. Wilderer, Stefan Wuertz

Journal:

Year:

2002

Language:

english

File:

PDF, 638 KB

english, 2002

8

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Optical Microlithography XI - Lithographic process simulation for scanners

Erdmann, Andreas, Arnz, Michael, Maenhoudt, Mireille, Baselmans, Jan, van Osnabrugge, Jan-Chris, Van den Hove, Luc

Year:

1998

Language:

english

File:

PDF, 852 KB

english, 1998

9

Simultaneous P and N removal in a sequencing batch biofilm reactor: insights from reactor- and microscale investigations

A. Gieseke, P. Arnz, R. Amann, A. Schramm

Journal:

Year:

2002

Language:

english

File:

PDF, 333 KB

english, 2002

10

Application of Biofilms and Biofilm Support Materials As A Temporary Sink and Source

P. A. Wilderer, P. Arnz, E. Arnold

Journal:

Water, Air & Soil Pollution

Year:

2000

Language:

english

File:

PDF, 756 KB

english, 2000

11

The impact of aberration averaging during step-and-scan on the photolithographic process

A. Erdmann, M. Arnz

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 257 KB

english, 1998

12

SPIE Proceedings [SPIE 15th European Conference on Mask Technology for Integrated Circuits and Micro-Components - Munich, Germany (Monday 16 November 1998)] 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98 - Overlay mapping of microlithographic pattern generators by means of grouped structures

Arnz, Michael, Heppner, Joachim, Lessle, Werner, Behringer, Uwe F. W.

Year:

1999

Language:

english

File:

PDF, 2.68 MB

english, 1999

13

Roughness-induced scattering and attenuation of guided modes in slab waveguides

Arnz, M., Ponath, H.-E.

Journal:

Journal of the Optical Society of America A

Year:

1986

Language:

english

File:

PDF, 1.42 MB

english, 1986

14

SPIE Proceedings [SPIE 27th European Mask and Lithography Conference - Dresden, Germany (Tuesday 18 January 2011)] 27th European Mask and Lithography Conference - Correlation method based mask to mask overlay metrology for 32nm node and beyond

Seidel, D., Behringer, Uwe F.W., Arnz, M., Beyer, D.

Year:

2011

Language:

english

File:

PDF, 1.92 MB

english, 2011

15

σ-Homoacenaphthylene and π-Homoacenaphthene

Dr. Roland Arnz, José Walkimar de M. Carneiro, Dr. Wolfgang Klug, Dr. Hans Schmickler, Prof. Dr. Emanuel Vogel, Rolf Breuckmann, Prof. Dr. Frank-Gerrit Klärner

Journal:

Angewandte Chemie International Edition

Year:

1991

Language:

english

File:

PDF, 526 KB

english, 1991

16

σ-Homoacenaphthylen und π-Homoacenaphthen

Dr. Roland Arnz, José Walkimar de M. Carneiro, Dr. Wolfgang Klug, Dr. Hans Schmickler, Prof. Dr. Emanuel Vogel, Rolf Breuckmann, Prof. Frank-Gerrit Klärner

Journal:

Angewandte Chemie

Year:

1991

Language:

german

File:

PDF, 384 KB

german, 1991

17

Possible complication regarding phosphorus removal with a continuous flow biofilm system: Diffusion limitation

C. M. Falkentoft, P. Arnz, M. Henze, H. Mosbæk, E. Müller, P. A. Wilderer, P. Harremoës

Journal:

Biotechnology and Bioengineering

Year:

2001

Language:

english

File:

PDF, 458 KB

english, 2001

18

Streuung elektromagnetischer Wellen an rauhen Oberflächen mit anisotroper Autokorrelationsfunktion

Dipl.-Phys. M. Arnz, Dr. H.-E. Ponath

Journal:

Annalen der Physik

Year:

1987

Language:

german

File:

PDF, 488 KB

german, 1987

19

SPIE Proceedings [SPIE 18th European Mask Conference on Mask Technology for Integrated Circuits and Micro-Components - Munich-Unterhaching, Germany (Tuesday 15 January 2002)] 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Calibration of test reticles for qualification of imaging properties of microlithographic projection lenses

Haessler-Grohne, Wolfgang, Hahm, K, Mirande, Werner, Bosse, Harald, Arnz, Michael, Behringer, Uwe F. W.

Year:

2002

Language:

english

File:

PDF, 979 KB

english, 2002

20

SPIE Proceedings [SPIE Photomask and NGL Mask Technology XV - Yokohama, Japan (Wednesday 16 April 2008)] Photomask and Next-Generation Lithography Mask Technology XV - PROVE: a photomask registration and overlay metrology system for the 45 nm node and beyond

Klose, G., Beyer, D., Arnz, M., Kerwien, N., Rosenkranz, N., Horiuchi, Toshiyuki

Year:

2008

Language:

english

File:

PDF, 469 KB

english, 2008

21

Eight new MHC recombinant strains defining at least sixH-2haplotypes

Suzanne L. Epstein, J. Scott Arnz, David H. Sachs

Journal:

Year:

1986

Language:

english

File:

PDF, 307 KB

english, 1986

22

SPIE Proceedings [SPIE 21st European Mask and Lithography Conference - Dresden, Germany (Thursday 16 June 2005)] 21st European Mask and Lithography Conference - Flare metrology used for PSD reconstruction

Year:

2005

Language:

english

File:

PDF, 376 KB

english, 2005

23

Speech-accompanying gestures are not processed by the language-processing mechanisms

Jouravlev, Olessia, Zheng, David, Balewski, Zuzanna, Le Arnz Pongos, Alvince, Levan, Zena, Goldin-Meadow, Susan, Fedorenko, Evelina

Journal:

Neuropsychologia

Year:

2019

Language:

english

File:

PDF, 2.09 MB

english, 2019

24

Simultaneous loading and draining as a means to enhance efficacy of sequencing biofilm batch reactors

P Arnz, S Esterl, C Nerger, A Delgado, P.A Wilderer

Journal:

Year:

2000

Language:

english

File:

PDF, 410 KB

english, 2000

25

Interception of Small Particles by Flocculent Structures, Sessile Ciliates, and the Basic Layer of a Wastewater Biofilm

Eisenmann, H., Letsiou, I., Feuchtinger, A., Beisker, W., Mannweiler, E., Hutzler, P., Arnz, P.

Journal:

Applied and Environmental Microbiology

Year:

2001

Language:

english

File:

PDF, 1.49 MB

english, 2001

26

Thermogravimetric analysis for rapid assessment of moisture diffusivity in polydisperse powder and thin film matrices

Thirunathan, Praveena, Arnz, Patrik, Husny, Joeska, Gianfrancesco, Alessandro, Perdana, Jimmy

Journal:

Year:

2018

Language:

english

File:

PDF, 490 KB

english, 2018

27

SPIE Proceedings [SPIE 24th European Mask and Lithography Conference - Dresden, Germany (Monday 21 January 2008)] 24th European Mask and Lithography Conference - High-resolution and high-precision pattern placement metrology for the 45 nm node and beyond

Klose, G., Buttgereit, U., Arnz, M., Rosenkranz, N., Behringer, Uwe F.

Year:

2008

Language:

english

File:

PDF, 940 KB

english, 2008

28

SPIE Proceedings [SPIE 25th European Mask and Lithography Conference - Dresden, Germany (Monday 12 January 2009)] 25th European Mask and Lithography Conference - Monte Carlo simulations of image analysis for flexible and high-resolution registration metrology

Arnz, M., Behringer, Uwe F. W., Klose, G., Troll, G., Beyer, D., Mueller, A.

Year:

2009

Language:

english

File:

PDF, 2.10 MB

english, 2009

29

Enhanced biological phosphorus removal in a semifull-scale SBBR

Arnz, P., Arnold, E., Wilderer, P. A.

Journal:

Water Science and Technology

Year:

2001

Language:

english

File:

PDF, 158 KB

english, 2001

30

Electric field generation in hollow dielectric waveguide lasers I: General theory of unperturbed symmetric waveguide configuration

Arnz, M., Ponath, H.-E.

Journal:

Journal of the Optical Society of America B

Year:

1988

Language:

english

File:

PDF, 1.50 MB

english, 1988

31

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 19 September 2011)] Photomask Technology 2011 - In-die photomask registration and overlay metrology with PROVE using 2D correlation methods

Seidel, D., Maurer, Wilhelm, Abboud, Frank E., Arnz, M., Beyer, D.

Year:

2011

Language:

english

File:

PDF, 2.31 MB

english, 2011

32

Electric field generation in hollow dielectric waveguide lasers II: First-order perturbation theory in the presence of waveguide imperfections due to rough boundaries

Arnz, M., Ponath, H.-E.

Journal:

Journal of the Optical Society of America B

Year:

1988

Language:

english

File:

PDF, 1.01 MB

english, 1988

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